Dataset: Influence of a Silicon-Bearing Film on the Early Stage Oxidation of Pure Titanium
Samples
7
in dataset
Process Types
12
unique activities
Avg Process Depth
4.9
processes per sample
With Processes
7
have ≥1 process
Process Participation
How many samples participated in each process
Sample Depth
How many processes each sample participated in
| Name | 50 nm Si Deposition and Oxidation Isothermal Exposure - 2h | 50 nm Si Deposition and Oxidation Isothermal Exposure - 8h | Colloidal Silica Deposition and Oxidation Isothermal Exposure - 2h | Hardness Profiles | Obtain Titanium Material | Oxidation Isothermal Exposure - 0.5h | Oxidation Isothermal Exposure - 2h | Oxidation Isothermal Exposure - 8h | Sectioning | SEM | STEM EDS | TEM |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Ti-0.5h | X | X | X | X | X | |||||||
| Ti/Si50nm-2h | X | X | X | X | X | X | ||||||
| Ti-8h | X | X | X | X | X | |||||||
| Ti-2h | X | X | X | X | X | |||||||
| Ti/Si50nm-8h | X | X | X | X | X | X | ||||||
| Commercially Pure (99.999%) Titanium Plate | X | X | X | |||||||||
| Ti/SiO2 | X | X | X | X |